- 2 March, 2022
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Description :
Carbon Tetrafluoride (CF4) is the most widely used plasma etching metal in the microelectronics industry today. It is used for etching silicon, silicon dioxide, silicon nitride, phosphorosilicate glass and tungsten film materials. CF4 is also widely used in the fields of surface cleaning of electronic devices or printed circuits, manufacturing of solar cells, laser technology, gas insulation, refrigeration, leak testing, control. space rockets and detergents in industrial printed circuit production. Possessing extremely chemically stable properties, CF4 can also be used in the smelting industry and the plastics industry.